CABB

TOK's ArF photoresists use norbornene-maleic anhydride copolymers — alternating copolymerization chemistry that controls dissolution contrast. Every advanced node chip was patterned with TOK or JSR resist chemistry.

Barentz distributes active pharmaceutical ingredients, excipients, vitamins, and food additives across Europe and Asia. Our formulation labs in 25+ countries bridge manufacturer innovation with local market needs.

JSR's EUV photoresists pattern 5nm chips — chemically amplified resists where a single photon triggers a cascade of acid-catalyzed deprotection. Polymer chemistry defining Moore's Law at the atomic frontier.