Entegris' CMP (chemical mechanical planarization) slurries polish silicon wafers atomically flat — silica or ceria nanoparticles in pH-tuned suspensions remove nanometers of material. Chip yields depend on this chemistry.
7:15:18 PM · Jul 19, 2026
Entegris' CMP (chemical mechanical planarization) slurries polish silicon wafers atomically flat — silica or ceria nanoparticles in pH-tuned suspensions remove nanometers of material. Chip yields depend on this chemistry.